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Air-exposure-induced gas-molecule incorporation into spiro-MeOTAD films

Author(s): Ono, LK; Schulz, P; Endres, JJ; Nikiforov, GO; Kato, Y; et al

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dc.contributor.authorOno, LK-
dc.contributor.authorSchulz, P-
dc.contributor.authorEndres, JJ-
dc.contributor.authorNikiforov, GO-
dc.contributor.authorKato, Y-
dc.contributor.authorKahn, Antoine-
dc.contributor.authorQi, Y-
dc.date.accessioned2020-10-30T19:18:07Z-
dc.date.available2020-10-30T19:18:07Z-
dc.date.issued2014-03-27en_US
dc.identifier.citationOno, LK, Schulz, P, Endres, JJ, Nikiforov, GO, Kato, Y, Kahn, A, Qi, Y. (2014). Air-exposure-induced gas-molecule incorporation into spiro-MeOTAD films. Journal of Physical Chemistry Letters, 5 (1374 - 1379. doi:10.1021/jz500414men_US
dc.identifier.urihttp://arks.princeton.edu/ark:/88435/pr1sr6g-
dc.description.abstractCombined photoemission and charge-transport property studies of the organic hole transport material 2,2′,7,7′-tetrakis(N,N-di-p- methoxyphenylamine)-9,9′-spirobifluorene (spiro-MeOTAD) under air exposure and controlled environments of O2, H2O + N2, and N2 (1 atm and under dark conditions) reveal the incorporation of gas molecules causing a decrease in charge mobility. Ultraviolet photoelectron spectroscopy shows the Fermi level shifts toward the highest occupied molecular orbital of spiro-MeOTAD when exposed to air, O2, and H2O resembling p-type doping. However, no traces of oxidized spiro-MeOTAD + are observed by X-ray photoelectron spectroscopy (XPS) and UV-visible spectroscopy. The charge-transport properties were investigated by fabricating organic field-effect transistors with the 10 nm active layer at the semiconductor-insulator interface exposed to different gases. The hole mobility decreases substantially upon exposure to air, O2, and H2O. In the case of N2, XPS reveals the incorporation of N2 molecules into the film, but the decrease in the hole mobility is much smaller.en_US
dc.format.extent1374 - 1379en_US
dc.language.isoen_USen_US
dc.relation.ispartofJournal of Physical Chemistry Lettersen_US
dc.rightsFinal published version. Article is made available in OAR by the publisher's permission or policy.en_US
dc.titleAir-exposure-induced gas-molecule incorporation into spiro-MeOTAD filmsen_US
dc.typeJournal Articleen_US
dc.identifier.doidoi:10.1021/jz500414m-
dc.date.eissued2014-03-27en_US
pu.type.symplectichttp://www.symplectic.co.uk/publications/atom-terms/1.0/journal-articleen_US

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