Investigation of the High Electron Affinity Molecular Dopant F6‐TCNNQ for Hole‐Transport Materials
Author(s): Zhang, Fengyu; Kahn, Antoine
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Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Zhang, Fengyu | - |
dc.contributor.author | Kahn, Antoine | - |
dc.date.accessioned | 2019-10-04T20:44:03Z | - |
dc.date.available | 2019-10-04T20:44:03Z | - |
dc.date.issued | 2017 | en_US |
dc.identifier.citation | Zhang, F, Kahn, A. (2017). Investigation of the High Electron Affinity Molecular Dopant F6‐TCNNQ for Hole‐Transport Materials. Advanced Functional Materials, 28, 1703780. doi:10.1002/adfm.201703780 | en_US |
dc.identifier.issn | 1616-301X | - |
dc.identifier.uri | http://arks.princeton.edu/ark:/88435/pr1hm9f | - |
dc.description.abstract | 2,2′-(perfluoronaphthalene-2,6-diylidene)dimalononitrile (F6-TCNNQ) is investigated as a molecular p-type dopant in two hole-transport materials, 2,2′,7,7′-tetrakis(N,N-diphenylamino)-9,9-spirobifluorene (Spiro-TAD) and tris(4-carbazoyl-9-ylphenyl)amine (TCTA). The electron affinity of F6-TCNNQ is determined to be 5.60 eV, one of the strongest organic molecular oxidizing agents used to date in organic electronics. p-Doping is found to be effective in Spiro-TAD (ionization energy = 5.46 eV) but not in TCTA (ionization energy =5.85 eV). Optical absorption measurements demonstrate that charge transfer is the predominant doping mechanism in Spiro-TAD:F6-TCNNQ. The host–dopant interaction also leads to a significant alteration of the host film morphology. Finally, transport measurements done on Spiro-TAD:F6-TCNNQ as a function of dopant concentration and temperature, and using a highly doped contact layer to ensure negligible hole injection barrier, lead to an accurate measurement of the film conductivity and hole-hopping activation energy. | en_US |
dc.format.extent | 1703780 (1 - 8) | en_US |
dc.language.iso | en_US | en_US |
dc.relation.ispartof | Advanced Functional Materials | en_US |
dc.rights | Author's manuscript | en_US |
dc.title | Investigation of the High Electron Affinity Molecular Dopant F6‐TCNNQ for Hole‐Transport Materials | en_US |
dc.type | Journal Article | en_US |
dc.identifier.doi | doi:10.1002/adfm.201703780 | - |
dc.identifier.eissn | 1616-3028 | - |
pu.type.symplectic | http://www.symplectic.co.uk/publications/atom-terms/1.0/journal-article | en_US |
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File | Description | Size | Format | |
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Zhang Kahn Adv. Funct. Mat. 2017.pdf | 1.02 MB | Adobe PDF | View/Download |
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