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Integration of metallic nanostructures in fluidic channels for fluorescence and Raman enhancement by nanoimprint lithography and lift-off on compositional resist stack

Author(s): Wang, C; Chou, Stephen Y

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dc.contributor.authorWang, C-
dc.contributor.authorChou, Stephen Y-
dc.date.accessioned2018-07-20T15:10:05Z-
dc.date.available2018-07-20T15:10:05Z-
dc.date.issued2012-10en_US
dc.identifier.citationWang, C, Chou, SY. (2012). Integration of metallic nanostructures in fluidic channels for fluorescence and Raman enhancement by nanoimprint lithography and lift-off on compositional resist stack. Microelectronic Engineering, 98 (693 - 697. doi:10.1016/j.mee.2012.05.051en_US
dc.identifier.urihttp://arks.princeton.edu/ark:/88435/pr1h672-
dc.description.abstractWe present and demonstrate a novel fabrication method to integrate metallic nanostructures into fluidic systems, using nanoimprint lithography and lift-off on a compositional resist stack, which consists of multi-layers of SiO 2 and polymer patterned from different fabrication steps. The lift-off of the stack allows the final nano-features precisely aligned in the proper locations inside fluidic channels. The method provides high-throughput low-cost patterning and compatibility with various fluidic channel designs, and will be useful for fluorescence and Raman scattering enhancement in nano-fluidic systems.en_US
dc.format.extent693 - 697en_US
dc.language.isoen_USen_US
dc.relation.ispartofMicroelectronic Engineeringen_US
dc.rightsAuthor's manuscripten_US
dc.titleIntegration of metallic nanostructures in fluidic channels for fluorescence and Raman enhancement by nanoimprint lithography and lift-off on compositional resist stacken_US
dc.typeConference Articleen_US
dc.identifier.doidoi:10.1016/j.mee.2012.05.051-
dc.date.eissued2012-06-13en_US
pu.type.symplectichttp://www.symplectic.co.uk/publications/atom-terms/1.0/journal-articleen_US

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