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|Abstract:||Optical spectrometry in the visible and near-infrared range has a wide range of applications in healthcare, sensing, imaging, and diagnostics. This paper presents the first fully integrated optical spectrometer in standard bulk CMOS process without custom fabrication, postprocessing, or any external optical passive structure such as lenses, gratings, collimators, or mirrors. The architecture exploits metal interconnect layers available in CMOS processes with subwavelength feature sizes to guide, manipulate, control, diffract light, integrated photodetector, and read-out circuitry to detect dispersed light, and then back-end signal processing for robust spectral estimation. The chip, realized in bulk 65-nm low power-CMOS process, measures 0.64 mm $\times$ 0.56 mm in active area, and achieves 1.4 nm in peak detection accuracy for continuous wave excitations between 500 and 830 nm. This paper demonstrates the ability to use these metal-optic nanostructures to miniaturize complex optical instrumentation into a new class of optics-free CMOS-based systems-on-chip in the visible and near-IR for various sensing and imaging applications.|
|Citation:||Hong, L, Sengupta, K. (2017). Fully Integrated Optical Spectrometer in Visible and Near-IR in CMOS. IEEE Transactions on Biomedical Circuits and Systems, 11 (1176 - 1191. doi:10.1109/TBCAS.2017.2774603|
|Pages:||1176 - 1191|
|Type of Material:||Journal Article|
|Journal/Proceeding Title:||IEEE Transactions on Biomedical Circuits and Systems|
|Version:||Final published version. This is an open access article.|
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