Generation of nanoscale anticounterfeiting patterns on silicon by optical trap assisted nanopatterning

Abstract

Among the different strategies aimed at protecting products from counterfeiting, hidden securitypatterns are used by manufacturers to mark their products in a unique way. However, mostanticounterfeiting patterns bear the risk of being reproduced by an unauthorized party who hasgained knowledge of the exact technique and process parameters. In this paper, we use optical trapassisted nanopatterning to create unique security markings by taking advantage of statisticalfluctuations when generating nanoscale features within the pattern. We image the patterns byoptical microscopy, scanning electron microscopy, and atomic force microscopy and propose athree-level examination process that allows for an efficient yet highly secure authentication.