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Cryogenic Characterization of FBK HD Near-UV Sensitive SiPMs

Author(s): Acerbi, Fabio; Davini, Stefano; Ferri, Alessandro; Galbiati, Cristiano; Giovanetti, Graham; et al

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Abstract: We report on the characterization of near-ultraviolet high-density silicon photomultiplier (SiPM) developed at Fondazione Bruno Kessler (FBK) at cryogenic temperature. A dedicated setup was built to measure the primary dark noise and correlated noise of the SiPMs between 40 and 300 K. Moreover, an analysis program and data acquisition system were developed to allow the precise characterization of these parameters, some of which can vary up to seven orders of magnitude between room temperature and 40 K. We demonstrate that it is possible to operate the FBK near-ultraviolet high density SiPMs at temperatures lower than 100 K with a dark rate below 0.01 cps/mm(2) and total correlated noise probability below 35% at an overvoltage of 6 V. These results are relevant for the development of future cryogenic particle detectors using SiPMs as photosensors.
Publication Date: Feb-2017
Electronic Publication Date: 5-Jan-2017
Citation: Acerbi, Fabio, Davini, Stefano, Ferri, Alessandro, Galbiati, Cristiano, Giovanetti, Graham, Gola, Alberto, Korga, George, Mandarano, Andrea, Marcante, Marco, Paternoster, Giovanni, Piemonte, Claudio, Razeto, Alessandro, Regazzoni, Veronica, Sablone, Davide, Savarese, Claudio, Zappaly, Gaetano, Zorzi, Nicola. (2017). Cryogenic Characterization of FBK HD Near-UV Sensitive SiPMs. IEEE TRANSACTIONS ON ELECTRON DEVICES, 64 (521 - 526. doi:10.1109/TED.2016.2641586
DOI: doi:10.1109/TED.2016.2641586
ISSN: 0018-9383
EISSN: 1557-9646
Pages: 521 - 526
Type of Material: Journal Article
Version: Author's manuscript

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