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Novel Family of Chiral-Based Topological Insulators: Elemental Tellurium under Strain

Author(s): Agapito, Luis A; Kioussis, Nicholas; Goddard, William A; Ong, Nai Phuan

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dc.contributor.authorAgapito, Luis A-
dc.contributor.authorKioussis, Nicholas-
dc.contributor.authorGoddard, William A-
dc.contributor.authorOng, Nai Phuan-
dc.date.accessioned2018-07-20T15:08:36Z-
dc.date.available2018-07-20T15:08:36Z-
dc.date.issued2013-04-26en_US
dc.identifier.citationAgapito, Luis A, Kioussis, Nicholas, Goddard, William A, Ong, NP. (2013). Novel Family of Chiral-Based Topological Insulators: Elemental Tellurium under Strain. PHYSICAL REVIEW LETTERS, 110 (10.1103/PhysRevLett.110.176401en_US
dc.identifier.issn0031-9007-
dc.identifier.urihttp://arks.princeton.edu/ark:/88435/pr18m24-
dc.description.abstractEmploying ab initio electronic structure calculations, we predict that trigonal tellurium consisting of weakly interacting helical chains undergoes a trivial insulator to strong topological insulator (metal) transition under shear (hydrostatic or uniaxial) strain. The transition is demonstrated by examining the strain evolution of the band structure, the topological Z(2) invariant and the concomitant band inversion. The underlying mechanism is the depopulation of the lone-pair orbitals associated with the valence band via proper strain engineering. Thus, Te becomes the prototype of a novel family of chiral-based three-dimensional topological insulators with important implications in spintronics, magneto-optics, and thermoelectrics. DOI: 10.1103/PhysRevLett.110.176401en_US
dc.language.isoenen_US
dc.relation.ispartofPHYSICAL REVIEW LETTERSen_US
dc.rightsFinal published version. This is an open access article.en_US
dc.titleNovel Family of Chiral-Based Topological Insulators: Elemental Tellurium under Strainen_US
dc.typeJournal Articleen_US
dc.identifier.doidoi:10.1103/PhysRevLett.110.176401-
dc.date.eissued2013-04-24en_US
pu.type.symplectichttp://www.symplectic.co.uk/publications/atom-terms/1.0/journal-articleen_US

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