To refer to this page use:
|Abstract:||We present and demonstrate a novel fabrication method to integrate metallic nanostructures into fluidic systems, using nanoimprint lithography and lift-off on a compositional resist stack, which consists of multi-layers of SiO 2 and polymer patterned from different fabrication steps. The lift-off of the stack allows the final nano-features precisely aligned in the proper locations inside fluidic channels. The method provides high-throughput low-cost patterning and compatibility with various fluidic channel designs, and will be useful for fluorescence and Raman scattering enhancement in nano-fluidic systems.|
|Electronic Publication Date:||13-Jun-2012|
|Citation:||Wang, C, Chou, SY. (2012). Integration of metallic nanostructures in fluidic channels for fluorescence and Raman enhancement by nanoimprint lithography and lift-off on compositional resist stack. Microelectronic Engineering, 98 (693 - 697. doi:10.1016/j.mee.2012.05.051|
|Pages:||693 - 697|
|Type of Material:||Conference Article|
|Journal/Proceeding Title:||Microelectronic Engineering|
Items in OAR@Princeton are protected by copyright, with all rights reserved, unless otherwise indicated.