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Integration of metallic nanostructures in fluidic channels for fluorescence and Raman enhancement by nanoimprint lithography and lift-off on compositional resist stack

Author(s): Wang, C; Chou, Stephen Y

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Abstract: We present and demonstrate a novel fabrication method to integrate metallic nanostructures into fluidic systems, using nanoimprint lithography and lift-off on a compositional resist stack, which consists of multi-layers of SiO 2 and polymer patterned from different fabrication steps. The lift-off of the stack allows the final nano-features precisely aligned in the proper locations inside fluidic channels. The method provides high-throughput low-cost patterning and compatibility with various fluidic channel designs, and will be useful for fluorescence and Raman scattering enhancement in nano-fluidic systems.
Publication Date: Oct-2012
Electronic Publication Date: 13-Jun-2012
Citation: Wang, C, Chou, SY. (2012). Integration of metallic nanostructures in fluidic channels for fluorescence and Raman enhancement by nanoimprint lithography and lift-off on compositional resist stack. Microelectronic Engineering, 98 (693 - 697. doi:10.1016/j.mee.2012.05.051
DOI: doi:10.1016/j.mee.2012.05.051
Pages: 693 - 697
Type of Material: Conference Article
Journal/Proceeding Title: Microelectronic Engineering
Version: Author's manuscript



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